Abstract

GARCIA-GRADILLA, V.; SOTO-HERRERA, G.; MACHORRO-MEJIA, R.  and  MITRANI-ABENCHUCHAN, E.. Modelo del voltaje de descarga en depósitos de ZrO_X por erosión iónica reactiva. Rev. mex. fis. [online]. 2009, vol.55, n.2, pp.106-111. ISSN 0035-001X.

A Berg model application for ZrO_X thin film deposition by DC reactive sputtering is presented. An alternative treatment to this model is proposed, focused on an engineering point of view. Berg model involves target poisoning as a compound covering a fraction of the target surface, pressure, input flow and pumping speed. In the alternative treatment presented, all these quantities -some hard to be measured-are condensed by considering variations in the target voltage and plasma impedance, that together comprises the discharge voltage. The advantage of this handling is that can be easily used by a field engineer, without necessity of advanced knowledge in material science.

Keywords : DC reactive sputtering; discharge voltage; thin film.