Abstract

TIZNADO, H. et al. TiO₂ and Al₂O₃ ultra thin nanolaminates growth by ALD; instrument automation and films characterization. Rev. mex. fis. [online]. 2012, vol.58, n.6, pp.459-465. ISSN 0035-001X.

We report on the development of a fully operational atomic layer deposition (ALD) system. This system is computer-controlled and can deposit multilayered systems without user intervention. We describe the design of manifold, reaction chamber and exhaust. Additionally we give some features of the automatization software and electronics. To evaluate the ALD performance we used as precursor trymethyl aluminum (TMA) and tetrakis (dimethylamino) titanium (TDMAT) to deposit Al₂O₃ and TiO₂, respectively, in nanolaminated film structures. The thicknesses and composition of the films are precisely controlled, as determined by spectroscopic ellipsometry, and the nanolaminates have a sharp interface as indicated by Auger depth profile.

Keywords : Atomic layer deposition; nanolaminates; instrumentation; automation; ellipsometry.