Abstract

MEJIA, J.; FLORES-ROMERO, E.; TREJO-LUNA, R.  and  RICKARDS, J.. Planar waveguides produced by implanting Si and C ions in rutile. Rev. mex. fis. [online]. 2018, vol.64, n.3, pp.251-253. ISSN 0035-001X.

Planar waveguides were generated in samples of rutile crystal (TiO2) by bombarding with two types of ion: silicon and carbon. Rutile is used because of its anisotropic properties, particularly its birefringence. The guide is generated due to damage caused by the ions in the crystal which change its index of refraction. Three parameters were used: the implantation ion energy, the implantation fluence, and the orientation of the crystallographic planes. The refractive index profile of the irradiated sample was calculated and together with the value of the optical barrier the comparison was made between the different waveguides generated.

Keywords : Optical Waveguides; Ion Implantation; Rutile; Important Optical properties of Crystals; Various Crystal Faces; Ions; Fluences; Two Different Ions-Damage; Reduce Fluence With Si Ions.

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