Abstract

CRUZ ALMAZAN, M. A. et al. Cu₄O₃ thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target. Rev. mex. fis. [online]. 2021, vol.67, n.3, pp.495-499.  Epub Feb 21, 2022. ISSN 0035-001X.  https://doi.org/10.31349/revmexfis.67.495.

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000oC for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the thin films are also composed of amorphous CuO and Cu2O.

Keywords : Paramelaconite; Cu4O3; non reactive sputtering; thermal oxidation.