Abstract

CAMACHO-LOPEZ, M. A. et al. Characterization of nanostructured SnO₂ films deposited by reactive DC-magnetron sputtering. Superf. vacío [online]. 2013, vol.26, n.3, pp.95-99. ISSN 1665-3521.

Nanostructured tin oxide thin films were deposited on silicon and glass slides substrates by reactive DC-Magnetron sputtering using a tin target in a mixture of argon and oxygen gases. The substrate temperature was varied in the range from 53 to 243 ^oC, keeping the other deposition parameters constant. The tin oxide films were characterized by: Scanning Electron Microscopy, Energy Dispersive Spectrometry, X Ray Diffraction, microRaman spectroscopy and UV-VIS spectroscopy. It was found that the substrate temperature has an effect mainly on the structural, morphological and optical properties of the thin films. At 53 and 90 ^oC the tetragonal crystalline phase was obtained while a mixture of crystalline phases (o-SnO₂ and t-SnO₂) was obtained at 148, 185 and 243 ^oC.

Keywords : DC-magnetron sputtering; Tin Oxide; Raman spectroscopy.