SciELO - Scientific Electronic Library Online

 
vol.64 número4Recent progress in confined atoms and molecules: Superintegrability and symmetry breakingsSíntesis y caracterización electroquímica de recubrimientos de multicapas metal cerámico de W/WN, Ti/TiN y WTiN índice de autoresíndice de assuntospesquisa de artigos
Home Pagelista alfabética de periódicos  

Serviços Personalizados

Journal

Artigo

Indicadores

Links relacionados

  • Não possue artigos similaresSimilares em SciELO

Compartilhar


Revista mexicana de física

versão impressa ISSN 0035-001X

Resumo

VILLEGAS, E.; PARRA, R.  e  RAMAJO, L.. Métodos de medición de espesores de películas delgadas basadas en óxidos semiconductores. Rev. mex. fis. [online]. 2018, vol.64, n.4, pp.364-367. ISSN 0035-001X.

Transparent films based on Ti, Sn and Zn oxides are of great importance in electronic devices such as sensors, solar cells and conductive films, then the characterization techniques are highly relevant. The aim of this work is to identify the advantages and disadvantages of direct methods, such as profilometry, and indirect methods such as ellipsometry and spectrophotometry used to quantify film thickness. In this work, films were deposited by spray-pyrolysis on glass substrates at 425°C. Thicknesses varied between 150 and 300 nm. Thicknesses calculated by means of spectrophotometry and ellipsometry, led to differences below 10% and 20%, respectively, with respect to the value measured by profilometry.

Palavras-chave : Thin films; Thickness measurement; TiO2; SnO2; ZnO; 06; 78; 81.

        · resumo em Espanhol     · texto em Espanhol