Resumo

CHAVEZ VELAZQUEZ, Rosa; ZALDIVAR HUERTA, Ignacio; REYES BETANZO, Claudia  e  DIAZ SANCHEZ, Alejandro. Fabricación de guías de onda ópticas en silicio utilizando óxido de silicio y nitruro de silicio. Superf. vacío [online]. 2005, vol.18, n.4, pp.21-23. ISSN 1665-3521.

Planar optical waveguides of abrupt index refraction, using oxide silicon (SiO2) and silicon nitride (Si3N4) films obtained by means of PECVD technique were designed and realized. Optical, mechanicals and electrics characteristics were considered to selected silicon as substrate material. Testing of transmittance for a wavelength of 650 nm was successfully realized. The proposed optical waveguides are fully compatible with the CMOS fabrication process of the INAOE’s laboratory. Obtained results allows the integration of optical and electronics devices in a shared silicon substrate.

Palavras-chave : Integrated optics; Integrated optical waveguides; PECVD; Optical communications.