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Superficies y vacío
versão impressa ISSN 1665-3521
Superf. vacío vol.21 no.2 Ciudad de México Jun. 2008
Obtaining of films of tungsten trioxide (WO3) by resistive heating of a tungsten filament
J. DíazReyes1, V. DorantesGarcía2, A. PérezBenítez3, J. A. BalderasLópez4
1 CIBAIPN, Ex Hacienda de San Juan Molino Km. 1.5. Tepetitla, Tlaxcala. C. P. 90700. México.
2 Preparatoria Simón Bolívar, BUAP 4 Oriente 408. Col. Centro. C.P. 74200. Atlixco, Pue. México
3 FCQBUAP, 14 Sur y Av. San Claudio. Col. San Manuel. C. P. 72570 Puebla, Pue. México
4 UPIBIIPN, Av. Acueducto S/N, Col. Barrio la Laguna, C. P. 07340, México, D. F.
Recibido: 15 de enero de 2008.
Aceptado: 18 de marzo de 2008.
Abstract
Thin film of tungsten oxide (WO3) has been studied extensively as an electrochromic material and has numerous applications in electrochromic devices, smart windows, gas sensors and optical windows. In order to explore the possibility of using it in electrochromic devices, thorough study the optical properties of the WO3 is an important step. The WO3 layers have been grown by hotfilament metal oxide deposition technique under atmospheric pressure and an oxygen atmosphere. By FTIR and Raman scattering studies we found that the films contain hydrates. We have observed that the thin films of WO3 can be satisfactorily grown by this technique.
Keywords: WO3; Chemistry of light bulb; Infrared spectroscopy; Raman scattering.
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