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Journal of applied research and technology

versão On-line ISSN 2448-6736versão impressa ISSN 1665-6423

J. appl. res. technol vol.5 no.2 Ciudad de México Ago. 2007

 

Principal factors determination in the growth of thin films using Taguchi's technique

 

E. R. Vázquez-Cerón, V. R. Bárrales-Guadarrama, E. M. Rodríguez-Rodríguez, R. Barrales-Guadarrama.

 

UAM Azcapotzalco. Av. San Pablo # 180, Col. Reynosa, Azcapotzalco, 02200. México, D.F., México, Email: vrbg@correo.azc.uam.mx

 

Abstract

A methodology to improve the production and quality of deposited thin films has been developed for the PLD technique. The main purpose is the optimization of electrical and transport properties of the films through the characterization of growth parameters concerning some important characteristics of the material such as roughness, resistance, homogeneity, etc. It improves the production process of thin films, and it also decreases costs, conserving the quality at the same time. The use of interpolations and orthogonal arrangements allows to evaluate the growth parameters and to predict results eliminating the need to repeat experiments.

 

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6. REFERENCES

[1] Phillip J. Ross, Taguchi Techniques for Quality Engineering, (Ed. McGraw-Hill, México),(1987).         [ Links ]

[2] K.Ishikawa, Guide to Quality Control,(Asian Productivity Organization, Tokyo, Japan, 1983).         [ Links ]

[3] R. E. Walpole y R. H. Myers, Probabilidad y Estadística, (Ed. McGraw-Hill, México), 624, (1992).         [ Links ]

[4] P. A. Redhead, The Physical Basis of Ultrahigh Vacuum, (Ed. Springer-Verlag New York), 2000.         [ Links ]

[5] Chrisey B., Douglas, Pulsed Laser Deposition of Thin Films, (ED. Wiley Interscience) 613, 1994.         [ Links ]

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