Resumo

MORALES HERNANDEZ, Jorge et al. Characterization of Thin Films Deposited by Physical Vapor Deposition (PVD), Using Electrochemical Impedance Spectroscopy (EIS) Technique. J. Mex. Chem. Soc [online]. 2015, vol.59, n.4, pp.308-313. ISSN 1870-249X.

In this paper the performance against corrosion of a thin film of NiCu deposited by Physical Vapor Deposition at two different times of deposition, was evaluated. Electrochemical Impedance results in NaCl solution, showed a gradual increase in resistivity due to the degradation of the film (delamination) for both times, along with the deposition of corrosion products on the coating generated by recombination of substrate oxides.

Palavras-chave : Corrosion; DC sputtering; Electrochemical Impedance Spectroscopy (EIS); nanodefects; PVD; Thin films.

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